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For the Inventor, By the Inventor

Fuchu, Japan

Hisashi Inoue

This inventor holds 16 USPTO granted patents and 1 published patent application, primarily in Semiconductor Processing. Top assignees: Tokyo Electron Limited, Furuya Metal Co., Ltd., Matsui Universal Joint Manufacturing Company. Active years: 1984-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisashi Inoue. Retrieved from https://idiyas.com/inventor/hisashi-inoue-qvwdonsv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 93.8

Average Co-Inventor Count = 3.4

ph-index = 4

Forward Citations = 98(Granted Patents)


Location History:

  • Tokyo, JP (1984 - 2009)
  • Yamanashi, JP (2009)
  • Tokyo-To, JP (2011)
  • Nirasaki, JP (2011 - 2012)
  • Fuchu, JP (2010 - 2015)
  • Iwate, JP (2018 - 2023)

Company Filing History:

goldMedal14 out of 10,933 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 30 
 
Furuya Metal Co., Ltd.
 patents
bronzeMedal1 out of 4 
 
Matsui Universal Joint Manufacturing Company
 patents
4. 1 out of 103 
 
Tokyo Electron Limi Ted
 patents
where one patent can have more than one assignee

Years Active: 1984-2026

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Areas of Expertise:
Temperature Control
Thermocouple Structure
Heat Treatment
Semiconductor Manufacturing
Substrate Processing
Assembling Apparatus
Heat Processing Apparatus
Reaction Tube
Direct Oxidation
Vertical Thermal Processing
Process Tube
Universal Joint
16 patents (USPTO):Explore Patents
1. 12709805 - TEMPERATURE CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS (2026-08-18),
2. 11815407 - Thermocouple structure, heat treatment apparatus, and method of manufacturing thermocouple structure (2023-11-14),
3. 11114318 - Assembling apparatus and assembling method for semiconductor manufacturing apparatus (2021-09-07),
4. 9857124 - Clamp apparatus, substrate carry-in/out apparatus using the same, and substrate processing apparatus (2018-01-02),
5. 9064916 - Heat treatment method and heat treatment apparatus (2015-06-23),
6. 8741064 - Heat treatment method and heat treatment apparatus (2014-06-03),
7. 8230806 - Heat treatment method and heat treatment apparatus wherein the substrate holder is composed of two holder constituting bodies that move relative to each other (2012-07-31),
8. 8216378 - Reaction tube and heat processing apparatus for a semiconductor process (2012-07-10),
9. 8153534 - Direct oxidation method for semiconductor process (2012-04-10),
10. 8002895 - Heat processing apparatus for semiconductor process (2011-08-23),
11. 7935188 - Vertical thermal processing apparatus and method of using the same (2011-05-03),
12. 7900579 - Heat treatment method wherein the substrate holder is composed of two holder constituting bodies that move relative to each other (2011-03-08),
13. 7860585 - Heat processing apparatus, method of automatically tuning control constants, and storage medium (2010-12-28),
14. D594488 - Process tube for manufacturing semiconductor wafers (2009-06-16),
15. D586768 - Process tube for manufacturing semiconductor wafers (2009-02-17),

Title: Hisashi Inoue: Innovator in Thermocouple Structures and Semiconductor Manufacturing

Introduction

Hisashi Inoue is a prominent inventor based in Fuchu, Japan, known for his significant contributions to the fields of thermocouple structures and semiconductor manufacturing. With a total of 15 patents to his name, Inoue has demonstrated a remarkable ability to innovate and improve existing technologies.

Latest Patents

Among his latest patents, Inoue has developed a thermocouple structure that includes a first element wire and second element wires made from different materials. This innovative design features an insulating covering member and a protective tube that accommodates the wires. Each second element wire is bonded to a different position on the first element wire, enhancing the thermocouple's functionality. Additionally, he has created an assembling apparatus for semiconductor manufacturing that includes a lift for vertically moving a reaction tube, a gas supply source, and an exhaust mechanism for conducting leakage tests.

Career Highlights

Inoue has worked with notable companies such as Tokyo Electron Limited and Matsui Universal Joint Manufacturing Company. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.

Collaborations

Some of his notable coworkers include Shunichi Matsumoto and Yasushi Takeuchi, who have collaborated with him on various projects throughout his career.

Conclusion

Hisashi Inoue's innovative work in thermocouple structures and semiconductor manufacturing has made a significant impact in the industry. His patents reflect his dedication to advancing technology and improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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