The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Mar. 23, 2009
Hirofumi Kaneko, Oshu, JP;
Hisashi Inoue, Fuchu, JP;
Keishi Shionaga, Fuchu, JP;
Shingo Hishiya, Nirasaki, JP;
Atsushi Endoh, Nirasaki, JP;
Hirofumi Kaneko, Oshu, JP;
Hisashi Inoue, Fuchu, JP;
Keishi Shionaga, Fuchu, JP;
Shingo Hishiya, Nirasaki, JP;
Atsushi Endoh, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A reaction tube for a semiconductor process for performing a heat process on a plurality of target objects stacked at intervals under a vacuum state is integrally made of an electrically insulating and heat-resistant material. The reaction tube includes a cylindrical sidewall that has a load port at a lower end for loading and unloading the target objects to and from the reaction tube, and a circular ceiling wall that closes an upper end of the sidewall and has a flat inner surface extending in a direction perpendicular to an axial direction of the sidewall. The ceiling wall has an annular groove formed in a peripheral region of an outer surface along the sidewall.