Hirofumi Kaneko is a prominent inventor based in Oshu, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 17 patents. His innovative work has advanced the capabilities of various processing devices used in semiconductor manufacturing and other applications.

Latest Patents

Among his latest inventions is a plasma processing device that features a vacuum container with controllable internal pressure. This device includes gas supply means, an electrode for substrate placement, and an antenna designed for inductive coupling. The antenna is connected to a high-frequency power source and is engineered to optimize the impedance for RF frequency applications. Another notable invention is a processing apparatus that consists of multiple process modules and a loader module. This apparatus is designed to accommodate and process several substrates simultaneously, enhancing efficiency in heat treatment and gas supply.

Career Highlights

Hirofumi Kaneko has worked with notable companies such as Tokyo Electron Limited and YAC Technologies Co., Ltd. His experience in these organizations has allowed him to refine his expertise in plasma processing and contribute to cutting-edge technologies in the industry.

Collaborations

Throughout his career, Kaneko has collaborated with talented individuals, including Atsushi Endo and Hiromi Nitadori. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Hirofumi Kaneko's contributions to plasma processing technology exemplify his dedication to innovation and excellence. His patents and collaborations continue to influence the industry, showcasing the importance of inventive minds in advancing technology.

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