Oshu, Japan

Hiroyuki Matsuura

USPTO Granted Patents = 45 

Average Co-Inventor Count = 2.0

ph-index = 12

Forward Citations = 420(Granted Patents)


Location History:

  • Musashino, JP (1985 - 2010)
  • Esashi, JP (2010)
  • Tokyo, JP (1987 - 2011)
  • Tokyo-To, JP (2009 - 2012)
  • Oshu, JP (2008 - 2018)
  • Iwate, JP (2019 - 2023)

Company Filing History:


Years Active: 1985-2025

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Areas of Expertise:
Heat Treatment
Plasma Processing
Semiconductor Manufacturing
CVD Method
Nuclear Magnetic Resonance
Optical Signal Processing
Substrate Processing
Film Formation
Interferometer Technology
Pressure Reduction Process
Pulse Pattern Generation
Optical Pickup
45 patents (USPTO):Explore Patents

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Title: The Innovative Journey of Hiroyuki Matsuura: Pioneering Plasma Processing Technologies

Introduction:

Hiroyuki Matsuura, a visionary inventor hailing from Oshu, Japan, has left a significant mark in the field of plasma processing with a remarkable portfolio of 42 patents. His dedication to advancing technology is evident in his latest patents, which revolutionize plasma processing apparatus design and methodologies.

Latest Patents:

Matsuura's recent patents showcase his ingenuity in developing cutting-edge plasma processing apparatus. One of his inventions includes a plasma processing apparatus featuring a cylindrical processing container with strategically positioned plasma electrodes and a radio-frequency power supply. In another patent, he introduces a plasma processing apparatus with a unique plasma partition wall that facilitates efficient raw material gas reactions within the processing container.

Career Highlights:

Having worked at esteemed companies such as Tokyo Electron Limited and Yokogawa Electric Corporation, Matsuura has honed his expertise in plasma processing technologies. His innovative solutions have garnered recognition within the industry, positioning him as a key player in advancing plasma processing methodologies.

Collaborations:

Throughout his career, Matsuura has collaborated with esteemed professionals in the field. Notable coworkers such as Tadashi Sugiyama and Katsutoshi Ishii have contributed to the success of Matsuura's groundbreaking inventions. Their collective efforts have propelled advancements in plasma processing technologies, shaping the landscape of the industry.

Conclusion:

In conclusion, Hiroyuki Matsuura's inventive spirit and commitment to pushing the boundaries of plasma processing technologies have established him as a trailblazer in the field. With a prolific portfolio of patents and a history of collaboration with industry experts, Matsuura continues to drive innovation and shape the future of plasma processing technologies.

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