Oshu, Japan

Hiroyuki Matsuura

This inventor holds 49 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Yokogawa Electric Corporation, Yokogawa Hokushin Electric Corp.. Active years: 1985-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Matsuura. Retrieved from https://idiyas.com/inventor/hiroyuki-matsuura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 49 

% Patents Active = 83.7

Average Co-Inventor Count = 2.0

ph-index = 12

Forward Citations = 425(Granted Patents)


Location History:

  • Musashino, JP (1985 - 2010)
  • Esashi, JP (2010)
  • Tokyo, JP (1987 - 2011)
  • Tokyo-To, JP (2009 - 2012)
  • Oshu, JP (2008 - 2018)
  • Iwate, JP (2019 - 2023)

Company Filing History:


Years Active: 1985-2026

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Areas of Expertise:
Plasma Processing
Heat Treatment
Semiconductor Manufacturing
Film Formation
Substrate Processing
CVD Method
Optical Signal Processing
Pressure Regulation
Interferometer
RF Electrode
Pulse Pattern Generation
49 patents (USPTO):Explore Patents

Sure, I'll create an article based on the information provided.

Title: The Innovative Journey of Hiroyuki Matsuura: Pioneering Plasma Processing Technologies

Introduction:

Hiroyuki Matsuura, a visionary inventor hailing from Oshu, Japan, has left a significant mark in the field of plasma processing with a remarkable portfolio of 42 patents. His dedication to advancing technology is evident in his latest patents, which revolutionize plasma processing apparatus design and methodologies.

Latest Patents:

Matsuura's recent patents showcase his ingenuity in developing cutting-edge plasma processing apparatus. One of his inventions includes a plasma processing apparatus featuring a cylindrical processing container with strategically positioned plasma electrodes and a radio-frequency power supply. In another patent, he introduces a plasma processing apparatus with a unique plasma partition wall that facilitates efficient raw material gas reactions within the processing container.

Career Highlights:

Having worked at esteemed companies such as Tokyo Electron Limited and Yokogawa Electric Corporation, Matsuura has honed his expertise in plasma processing technologies. His innovative solutions have garnered recognition within the industry, positioning him as a key player in advancing plasma processing methodologies.

Collaborations:

Throughout his career, Matsuura has collaborated with esteemed professionals in the field. Notable coworkers such as Tadashi Sugiyama and Katsutoshi Ishii have contributed to the success of Matsuura's groundbreaking inventions. Their collective efforts have propelled advancements in plasma processing technologies, shaping the landscape of the industry.

Conclusion:

In conclusion, Hiroyuki Matsuura's inventive spirit and commitment to pushing the boundaries of plasma processing technologies have established him as a trailblazer in the field. With a prolific portfolio of patents and a history of collaboration with industry experts, Matsuura continues to drive innovation and shape the future of plasma processing technologies.

I hope you find this article informative and engaging. If you need further details or have any specific requests, feel free to let me know!

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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