The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Jan. 12, 2010
Kohei Fukushima, Oshu, JP;
Toshiki Takahashi, Oshu, JP;
Hiroyuki Matsuura, Oshu, JP;
Yutaka Motoyama, Oshu, JP;
Kazuya Yamamoto, Nirasaki, JP;
Kohei Fukushima, Oshu, JP;
Toshiki Takahashi, Oshu, JP;
Hiroyuki Matsuura, Oshu, JP;
Yutaka Motoyama, Oshu, JP;
Kazuya Yamamoto, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field and confining a plasma generation area airtightly communicating with the process field, an ICP electrode disposed outside the plasma generation box and extending in a longitudinal direction of the plasma generation box, and an RF power supply connected to the ICP electrode. The ICP electrode includes a separated portion separated from a wall surface of the plasma generation box by a predetermined distance.