The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Aug. 30, 2005
Toshiji Abe, Tokyo-To, JP;
Toshiki Takahashi, Tokyo-To, JP;
Hiroyuki Matsuura, Tokyo-To, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma treating apparatus adapted to provide a predetermined plasma treatment to an object W to be treated comprises a processing chamberconfigured to be capable of being vacuumed, an object holding meansadapted to hold the object to be treated, a high frequency power sourceadapted to generate high frequency voltage, a plasma gas supplying meansadapted to supply a plasma generating gas to be treated to generate plasma to the processing chamber, a pair of plasma electrodesB connected to the output side of the high frequency power source via wiringsto generate plasma in the processing chamber, the pair of plasma electrodes being brought into an excited electrode state. In addition, a high frequency matching meansis provided in the middle of the wirings. In this case, each of the plasma electrodesA,B is not grounded. Thus, the plasma density can be increased, and the efficiency of generating plasma can be enhanced.