IDiyas

For the Inventor, By the Inventor

Nagasaki, Japan

Hiroshi Mashima

USPTO Granted Patents = 10 

Average Co-Inventor Count = 4.6

ph-index = 6

Forward Citations = 171(Granted Patents)


Location History:

  • Nagasaki-ken, JP (2002 - 2008)
  • Nagasaki, JP (2002 - 2015)

Company Filing History:

goldMedal10 out of 4,618 
 
Mitsubishi Heavy Industries Limited
 patents

Years Active: 2002-2015

Loading Chart...
10 patents (USPTO):
1. 8931432 - Vacuum processing apparatus (2015-01-13),
2. 8481848 - Photovoltaic device (2013-07-09),
3. 8088641 - Process for producing photovoltaic device (2012-01-03),
4. 7833587 - Method for plasma-enhanced chemical vapor deposition and apparatus for plasma-enhanced chemical vapor deposition (2010-11-16),
5. 7319295 - High-frequency power supply structure and plasma CVD device using the same (2008-01-15),
6. 7205034 - Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus (2007-04-17),
7. 7141516 - High frequency plasma generator and high frequency plasma generating method (2006-11-28),
8. 6456010 - Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus (2002-09-24),
9. 6363881 - Plasma chemical vapor deposition apparatus (2002-04-02),
10. 6353201 - Discharge electrode, RF plasma generation apparatus using the same, and power supply method (2002-03-05),

Title: Hiroshi Mashima: Innovator in Vacuum Processing and Photovoltaic Technology

Introduction

Hiroshi Mashima is a prominent inventor based in Nagasaki, Japan. He has made significant contributions to the fields of vacuum processing and photovoltaic technology. With a total of 10 patents to his name, Mashima's work has had a considerable impact on modern engineering and energy solutions.

Latest Patents

Mashima's latest patents include a vacuum processing apparatus designed to enhance deposition characteristics while minimizing equipment costs. This innovative apparatus features multiple discharge electrodes that create plasma with respect to a substrate, allowing for precise adjustments in deposition characteristics. Additionally, he has developed a large surface area photovoltaic device that boasts high conversion efficiency and excellent mass productivity. This device incorporates a crystalline silicon layer with specific in-plane distribution characteristics, ensuring optimal performance.

Career Highlights

Hiroshi Mashima is currently employed at Mitsubishi Heavy Industries Limited, where he continues to push the boundaries of technology. His work has not only advanced the field of vacuum processing but has also contributed to the development of more efficient solar energy solutions.

Collaborations

Mashima has collaborated with notable colleagues such as Yoshiaki Takeuchi and Keisuke Kawamura. Their combined expertise has fostered innovation and progress in their respective fields.

Conclusion

Hiroshi Mashima's contributions to vacuum processing and photovoltaic technology exemplify the spirit of innovation. His patents reflect a commitment to improving efficiency and reducing costs in critical engineering applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…