The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Oct. 29, 2002
Keisuke Kawamura, Nagasaki, JP;
Akemi Takano, Nagasaki, JP;
Hiroshi Mashima, Nagasaki, JP;
Hiromu Takatuka, Nagasaki, JP;
Yasuhiro Yamauti, Nagasaki, JP;
Yoshiaki Takeuchi, Nagasaki, JP;
Eishiro Sasakawa, Nagasaki, JP;
Keisuke Kawamura, Nagasaki, JP;
Akemi Takano, Nagasaki, JP;
Hiroshi Mashima, Nagasaki, JP;
Hiromu Takatuka, Nagasaki, JP;
Yasuhiro Yamauti, Nagasaki, JP;
Yoshiaki Takeuchi, Nagasaki, JP;
Eishiro Sasakawa, Nagasaki, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
A plasma generation device for generating plasma uniformly over a large surface area by very high frequency (VHF), which is installed in a plasma chemical vapor deposition apparatus. A first and a second power supply section are installed on both ends of the discharge electrode installed in a plasma chemical vapor deposition apparatus, and are supplied with alternate cycles: the first cycle wherein the first and second power supply sections receive high frequency waves at the same frequency, and a second cycle wherein different high frequency waves are received. In this manner, the state of plasma generation may be varied in each cycle, and when averaged over time, it makes possible uniform plasma generation over a large surface area.