The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Feb. 18, 2008
Keisuke Kawamura, Nagasaki, JP;
Hiroshi Mashima, Nagasaki, JP;
Keisuke Kawamura, Nagasaki, JP;
Hiroshi Mashima, Nagasaki, JP;
Mitsubishi Heavy Industries, Ltd., Minato-ku, Tokyo, JP;
Abstract
A vacuum processing apparatus is provided, in which a deposition characteristic is easily adjusted, and occurrence of difference in deposition characteristic between deposition chambers can be suppressed, and reduction in equipment cost can be achieved, and a deposition method using the vacuum processing apparatus is provided. The vacuum processing apparatus is characterized by having a plurality of discharge electrodes (to) that are supplied with high-frequency power from a power supply unit () through both ends () thereof, and form plasma with respect to a substrate () respectively, and a plurality of matching boxes (to) which tune phases and amplitudes of the high-frequency power supplied to the plurality of discharge electrodes (to) at the ends () respectively; wherein impedance of the plurality of matching boxes (to) are set to approximately the same value, and the impedance value is a value at which reflected power is approximately minimized, the reflected power being returned to the power supply unit () from one discharge electrode among the plurality of discharge electrodes (to).