The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2002
Filed:
Jul. 11, 2000
Hideo Yamakoshi, Yokohama, JP;
Kengou Yamaguchi, Yokohama, JP;
Masayoshi Murata, Nagasaki, JP;
Yoshiaki Takeuchi, Nagasaki, JP;
Yoshikazu Nawata, Nagasaki, JP;
Koji Satake, Yokohama, JP;
Satoshi Kokaji, Tokyo, JP;
Shoji Morita, Yokohama, JP;
Masatoshi Hisatome, Yokohama, JP;
Tatsuji Horioka, Tokyo, JP;
Hiroshi Mashima, Nagasaki, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
A plurality of electrode bars are arranged in parallel with each other, and side electrode bars are connected to the corresponding opposite ends of the electrode bars, thereby forming a ladder-like RF discharge electrode. Power supply points are arranged axisymmetrically with respect to a reference line, which is a bisector which bisects one side of the RF discharge electrode, while being spaced a predetermined distance from the reference line, thereby suppressing voltage distribution on the ladder electrode, which has an effect on uniformity of discharge distribution, to a sufficiently low level of nonuniformity. Thus, uniform distribution of film deposition rate can be obtained, thereby enabling uniform deposition even in large-area applications.