Kawasaki, Japan

Hirosato Ochimizu

This inventor holds 11 USPTO granted patents and 1 published patent application. Top assignees: Fujitsu Corporation, Fujitsu Semiconductor Limited. Active years: 1995-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirosato Ochimizu. Retrieved from https://idiyas.com/inventor/hirosato-ochimizu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 54.5

Average Co-Inventor Count = 2.6

ph-index = 6

Forward Citations = 155(Granted Patents)


Location History:

  • Kuwana, JP (2014 - 2016)
  • Kawasaki, JP (1995 - 2017)

Company Filing History:


Years Active: 1995-2017

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11 patents (USPTO):Explore Patents

Title: The Innovations of Hirosato Ochimizu: A Pioneer in Semiconductor Technology

Introduction: Hirosato Ochimizu is a notable inventor based in Kawasaki, Japan, known for his significant contributions to the field of semiconductor technology. With a total of 11 patents, his work has propelled advancements in the industry, particularly in the development of innovative semiconductor devices.

Latest Patents: Ochimizu's recent patents showcase his ingenuity and commitment to enhancing semiconductor technology. One of his notable inventions is a semiconductor device that features insulating layers containing oxygen and a barrier layer incorporating manganese. This device comprises an insulating layer built over a semiconductor substrate, which includes a first wire and a second wire formed in the insulating layer, designed with a projection portion extending downward from the first wire.

Another significant patent details a manufacturing method for a semiconductor device that includes a substrate with a through electrode. This electrode extends from one surface of the substrate to another, showcasing a protrusion at the second surface. The insulation layer on the second surface covers the protrusion's side surface and maintains a thickness exceeding the length of the protrusion, ensuring optimal functionality and reliability.

Career Highlights: Ochimizu has had an impressive career, during which he has worked at prominent companies such as Fujitsu Corporation and Fujitsu Semiconductor Limited. His experience at these organizations has significantly influenced his inventive spirit and has allowed him to contribute to groundbreaking developments in semiconductor technology.

Collaborations: Throughout his career, Ochimizu has collaborated with esteemed colleagues, including Toshihide Kikkawa and Atsuhiro Tsukune. These collaborations have fostered an environment of innovation and knowledge exchange, further enhancing the impact of their joint efforts in the semiconductor field.

Conclusion: Hirosato Ochimizu's contributions to semiconductor technology illustrate the crucial role inventors play in shaping the future of the industry. With his 11 patents, he continues to innovate and inspire future generations of inventors. His work not only establishes new technological standards but also reflects the dedication and creativity inherent in the field of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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