Location History:
- Nirasaki, JP (2002 - 2019)
- Yamanashi, JP (2018 - 2022)
Company Filing History:
Years Active: 2002-2024
Title: Hiroaki Ashizawa: Innovator in Semiconductor Technology
Introduction
Hiroaki Ashizawa is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His innovative approaches have advanced the methods used in film formation and semiconductor device manufacturing.
Latest Patents
Hiroaki Ashizawa's latest patents include a film forming method and a method for manufacturing semiconductor devices. One notable patent describes a system for manufacturing semiconductor devices, which involves forming a group V metal nitride film on a substrate. This process includes providing the substrate within a processing container and alternately supplying a raw material gas and a reducing gas. Another significant patent details a semiconductor film forming method using a hydrazine-based compound gas. This method involves a source gas adsorption process and a nitriding process to create a nitride film on a substrate.
Career Highlights
Throughout his career, Hiroaki Ashizawa has worked with notable companies, including Tokyo Electron Limited. His expertise in semiconductor technology has positioned him as a key player in the industry, contributing to advancements that enhance manufacturing processes.
Collaborations
Hiroaki has collaborated with esteemed colleagues such as Hideo Nakamura and Yosuke Serizawa. These partnerships have fostered innovation and development in semiconductor technologies.
Conclusion
Hiroaki Ashizawa's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in manufacturing processes and materials.