The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Mar. 19, 2014
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hiroaki Ashizawa, Nirasaki, JP;
Takaaki Iwai, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 49/02 (2006.01); C23C 16/18 (2006.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01); H01L 21/314 (2006.01); H01L 21/768 (2006.01); H01L 27/108 (2006.01); H01L 21/02 (2006.01); C23C 18/12 (2006.01);
U.S. Cl.
CPC ...
H01L 28/65 (2013.01); C23C 16/045 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01); C23C 18/1279 (2013.01); H01L 21/0228 (2013.01); H01L 21/3141 (2013.01); H01L 21/76823 (2013.01); H01L 27/10852 (2013.01); H01L 28/90 (2013.01);
Abstract
A ruthenium film formation method including: forming a ruthenium oxide film on a substrate; and reducing the ruthenium oxide film into a ruthenium film, wherein the reducing the ruthenium oxide film comprises at least supplying a ruthenium compound gas containing hydrogen as a reducing agent.