The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Jan. 12, 2009
Seishi Murakami, Nirasaki, JP;
Masaki Koizumi, Nirasaki, JP;
Hiroaki Ashizawa, Nirasaki, JP;
Masato Koizumi, Nirasaki, JP;
Seishi Murakami, Nirasaki, JP;
Masaki Koizumi, Nirasaki, JP;
Hiroaki Ashizawa, Nirasaki, JP;
Masato Koizumi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A treatment gas is supplied to form a Ti-based film on a predetermined number of wafers W while setting a temperature of a susceptorin a chamberto a predetermined temperature. After this, the interior of the chambercontaining no wafers W is cleaned by discharging Clgas as a cleaning gas from a shower headinto the chamber. During this cleaning, the temperature of each of the susceptor, the shower head, and the wall portion of the chamberis independently controlled so that the temperature of the susceptoris not lower than the decomposition start temperature of Clgas and the temperature of the shower headand the wall portion of the chamberis not higher than the decomposition start temperature.