Masato Koizumi is a prominent inventor based in Yamanashi-ken, Japan. He has made significant contributions to the field of film formation technology, holding a total of 5 patents. His innovative approaches have advanced the methods used in semiconductor manufacturing.

Latest Patents

Koizumi's latest patents include a film formation method, a cleaning method, and a film formation apparatus. The film formation method involves supplying a treatment gas to create a Ti-based film on a predetermined number of wafers while maintaining specific temperature settings within a chamber. Following this process, the chamber is cleaned by discharging Cl gas as a cleaning agent. The temperatures of the susceptor, shower head, and chamber walls are independently controlled to ensure optimal conditions during the cleaning phase. Another notable patent focuses on a film forming method that utilizes a film forming gas composed of a metal alkoxide. This method effectively suppresses contamination of the target substrate by preventing aluminum or aluminum alloys from dissolving in the processing chamber.

Career Highlights

Masato Koizumi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work has been instrumental in developing advanced technologies that enhance the efficiency and quality of film formation processes.

Collaborations

Koizumi has collaborated with notable colleagues such as Kazuya Okubo and Tsuyoshi Takahashi. Their combined expertise has contributed to the successful development of innovative solutions in the field.

Conclusion

Masato Koizumi's contributions to film formation technology have established him as a key figure in the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.

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