Tokyo, Japan

Hidetsugu Uchida

This inventor holds 10 USPTO granted patents and 1 published patent application. Top assignees: Oki Electric Industry Co., Ltd., Sicoxs Corporation, Kabushiki Kaisha Toyota Jidoshokki. Active years: 1990-2020.

USPTO Granted Patents = 10 

% Patents Active = 80.0

Average Co-Inventor Count = 1.9

ph-index = 5

Forward Citations = 121(Granted Patents)


Company Filing History:


Years Active: 1990-2020

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10 patents (USPTO):Explore Patents

Title: The Innovations of Hidetsugu Uchida

Introduction

Hidetsugu Uchida is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of semiconductor technology. With a total of 10 patents to his name, Uchida has made remarkable advancements that have influenced the industry.

Latest Patents

Uchida's latest patents include a technique related to a bonded semiconductor substrate capable of reducing interface resistance. This semiconductor substrate comprises a single-crystalline SiC substrate and a polycrystalline SiC substrate, which are bonded together. The bonded region contains a specific concentration of particular atoms, enhancing its performance. Another notable patent involves a method for manufacturing a semiconductor substrate, which includes irradiating the surfaces of two semiconductor layers with impurities in a vacuum. This method allows for the bonding of the layers and subsequent heat treatment, resulting in a refined concentration profile of the impurities.

Career Highlights

Throughout his career, Uchida has worked with notable companies such as Oki Electric Industry Co., Ltd. and Sicoxs Corporation. His work has been instrumental in advancing semiconductor technologies, making him a respected figure in the field.

Collaborations

Uchida has collaborated with talented individuals such as Ko Imaoka and Akiyuki Minami, contributing to various projects that have furthered semiconductor research and development.

Conclusion

Hidetsugu Uchida's innovative work in semiconductor technology has led to significant advancements in the industry. His patents and collaborations reflect his dedication to improving semiconductor performance and manufacturing processes.

Profile summary based on public USPTO records.
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