Hideki Makiyama

Title: The Innovative Contributions of Hideki Makiyama

Introduction: Hideki Makiyama is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 34 patents, Makiyama has made strides in developing methods and devices that enhance the performance of semiconductor components, particularly in preventing issues associated with short-channel characteristics and parasitic capacitance.

Latest Patents: Among his latest innovations is the manufacturing method of a semiconductor device that includes a field-effect transistor comprising a buried oxide (BOX) film and silicon layer. This invention focuses on preventing the occurrence of short-channel characteristics and parasitic capacitance of a MOSFET on a Silicon On Insulator (SOI) substrate. The method involves forming a sidewall with a stacked structure, which consists of a silicon oxide film and a nitride film, on the side wall of a gate electrode on the SOI substrate. Following this, an epitaxial layer is formed adjacent to the gate electrode, after which the nitride film is removed. The process then includes implanting an impurity into the upper surface of the semiconductor substrate, using the gate electrode and the epitaxial layer as a mask, to create a halo region in the area directly below both ends of the gate electrode.

Career Highlights: Makiyama has held influential positions at notable companies, particularly at Renesas Electronics Corporation and Renesas Electric Corporation. His work has significantly shaped the semiconductor industry, and he continues to innovate and push the boundaries of technology.

Collaborations: Throughout his career, Makiyama has collaborated with esteemed colleagues such as Toshiaki Iwamatsu and Yoshiki Yamamoto, contributing to the advancement of semiconductor technology and fostering innovation within the field.

Conclusion: Hideki Makiyama's extensive patent portfolio and impactful collaborations reflect his dedication to innovation in semiconductor manufacturing. His contributions not only enhance device performance but also pave the way for future advancements in electronic technology, solidifying his position as a leading inventor in the industry.