Haruhiro Harry Goto

Title: Haruhiro Harry Goto: Innovator in Plasma Technology

Introduction

Haruhiro Harry Goto is a prominent inventor based in Saratoga, CA (US), known for his significant contributions to plasma technology. With a total of 18 patents to his name, Goto has made remarkable advancements in methods for stripping photoresist and cleaning metal regions in semiconductor manufacturing.

Latest Patents

Among his latest patents, Goto has developed a process where plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine-containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs the gas mixture into the reaction chamber. This innovative process effectively removes both the crust and bulk resist layers at a high strip rate, leaving the workpiece surface substantially residue-free with low silicon loss. Additionally, he has created methods for cleaning metal regions overlying semiconductor substrates, which involve heating the metal region, forming a plasma from a gas comprising hydrogen and carbon dioxide, and exposing the metal region to the plasma.

Career Highlights

Haruhiro Harry Goto has worked with notable companies in the semiconductor industry, including Novellus Systems Incorporated and Applied Materials, Inc. His expertise in plasma technology has positioned him as a key figure in advancing manufacturing processes.

Collaborations

Goto has collaborated with several professionals in his field, including David Wingto Cheung and Kam S Law. These collaborations have contributed to the development of innovative solutions in semiconductor processing.

Conclusion

Haruhiro Harry Goto's contributions to plasma technology and semiconductor manufacturing have established him as a leading inventor in his field. His innovative patents and career achievements reflect his dedication to advancing technology in the industry.