The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Feb. 05, 2013
Applicant:
Novellus Systems, Inc., Fremont, CA (US);
Inventors:
David Chen, San Jose, CA (US);
Haruhiro Harry Goto, Saratoga, CA (US);
Martina Su, San Jose, CA (US);
Frank Greer, Pasadena, CA (US);
Shamsuddin Alokozai, Fremont, CA (US);
Assignee:
Novellus Systems, Inc., Fremont, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02071 (2013.01); H01L 21/02063 (2013.01); H01L 21/02074 (2013.01); H01L 21/31138 (2013.01); H01L 21/67069 (2013.01);
Abstract
Methods are provided for cleaning metal regions overlying semiconductor substrates. A method for removing material from a metal region comprises heating the metal region, forming a plasma from a gas comprising hydrogen and carbon dioxide, and exposing the metal region to the plasma.