The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Jul. 13, 2004
Haruhiro Harry Goto, Saratoga, CA (US);
Ilia Kalinovski, Berkeley, CA (US);
Khalid Mohamed, Santa Clara, CA (US);
Haruhiro Harry Goto, Saratoga, CA (US);
Ilia Kalinovski, Berkeley, CA (US);
Khalid Mohamed, Santa Clara, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
The present invention pertains to methods for removing unwanted material from a semiconductor wafer during wafer manufacturing. More specifically, the invention pertains to stripping photo-resist material and removing etch-related residues from a semiconductor wafer. Methods involve implementing a plasma operation using hydrogen and a weak oxidizing agent, such as carbon dioxide. The invention is effective at stripping photo-resist and removing residues from low-k dielectric material used in Damascene devices.