Hsin-chu, Taiwan

Han-Chung Chen


Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 34(Granted Patents)


Location History:

  • Hsin-Chu-Hsien, TW (1998 - 2000)
  • Hsin-Chu, TW (1999 - 2001)
  • Pao-Shan Hsiang, TW (2001)
  • Baoshan Township, Hsinchu County, TW (2007)

Company Filing History:


Years Active: 1998-2007

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7 patents (USPTO):Explore Patents

Title: Innovations of Han-Chung Chen

Introduction

Han-Chung Chen is a prominent inventor based in Hsin-chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

One of Han-Chung Chen's latest patents is titled "Fabrication of stacked dielectric layer for suppressing electrostatic charge buildup." This invention describes a method for fabricating a stacked dielectric layer that effectively suppresses electrostatic charge buildup. The process begins with providing a substrate that has metal layers, with gaps formed in between. A dielectric layer is then created through simultaneous deposition and ion-bombardment, ensuring it covers the bottom dielectric liner and fills the gaps. Finally, a top dielectric liner is formed on the dielectric layer through deposition without ion-bombardment. This method also includes a plasma treatment to further suppress electrostatic charge buildup, efficiently avoiding metal extrusion issues.

Another significant patent is the "Method for preventing delamination of APCVD BPSG films." This invention outlines a technique for forming BPSG layers over PECVD silicon oxide layers using atmospheric chemical vapor deposition with ozone and TEOS. The method is designed to prevent void formation in deep depressions found between metallization lines or closely spaced polysilicon structures in flash memory integrated circuits. By depositing the BPSG layer at an ozone/TEOS flow rate ratio of 12:1 or greater, the density of the BPSG layer is increased, which reduces shrinkage during planarization reflow and enhances line yield.

Career Highlights

Han-Chung Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to advancements in semiconductor fabrication techniques, making him a valuable asset to his company.

Collaborations

Throughout his career, Han-Chung Chen has collaborated with notable colleagues, including Chiarn-Lung Lee and Je Wang. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Han-Chung Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as a key inventor in the field. His innovative methods continue to influence the industry and improve the performance of semiconductor devices.

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