The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2001
Filed:
May. 27, 1999
Applicant:
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1311 ; H01L 2/131 ;
U.S. Cl.
CPC ...
H01L 2/1311 ; H01L 2/131 ;
Abstract
A method to store wafers, immediately after the deposition of a layer of BPSG, into an environment of dry air or dry N,or dry Ar or a N,O plasma chamber. This storage can occur over a variable period of time and with a variable delay between BPSG deposition and BPSG flow, dependent on which storage environment is applied. The surface of the deposited layer of BPSG is, in doing so, not exposed to H,O and the formation of unstable irregularities on the surface of the deposited BPSG is prevented.