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For the Inventor, By the Inventor

Los Gatos, CA, United States of America

Graham W Hills

This inventor holds 13 USPTO granted patents. Top assignees: Applied Materials, Inc., At&t Bell Laboratories, American Telephone & Telegraph Co., At&t Bell Laboratories. Active years: 1989-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Graham W Hills. Retrieved from https://idiyas.com/inventor/graham-w-hills

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13

% Patents Active = 100.0

Average Co-Inventor Count = 3.2

ph-index = 10

Forward Citations = 763(Granted Patents)


Location History:

  • Allentown, PA (US) (1989)
  • Salisbury, PA (US) (1990)
  • Salisbury Township Lehigh County, PA (US) (1991)
  • Los Gatos, CA (US) (1991 - 2001)

Company Filing History:

goldMedal8 out of 14,454 
 
Applied Materials, Inc.
 patents
silverMedal3 out of 3,345 
 
At&t Bell Laboratories
 patents
bronzeMedal1 out of 745 
 
American Telephone & Telegraph Co., At&t Bell Laboratories
 patents
4. 1 out of 3,945 
 
Lam Research Corporation
 patents

Years Active: 1989-2001

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13 patents (USPTO):Explore Patents
1. 6217786 - Mechanism for bow reduction and critical dimension control in etching silicon dioxide using hydrogen-containing additive gases in fluorocarbon gas chemistry (2001-04-17),
2. 6125788 - Plasma reactor with enhanced plasma uniformity by gas addition, reduced (2000-10-03),
3. 5744049 - Plasma reactor with enhanced plasma uniformity by gas addition, and (1998-04-28),
4. 5685914 - Focus ring for semiconductor wafer processing in a plasma reactor (1997-11-11),
5. 5534108 - Method and apparatus for altering magnetic coil current to produce etch (1996-07-09),
6. 5410122 - Use of electrostatic forces to reduce particle contamination in (1995-04-25),
7. 5382316 - Process for simultaneous removal of photoresist and polysilicon/polycide (1995-01-17),
8. 5242538 - Reactive ion etch process including hydrogen radicals (1993-09-07),
9. 5176790 - Process for forming a via in an integrated circuit structure by etching (1993-01-05),
10. 5057186 - Method of taper-etching with photoresist adhesion layer (1991-10-15),
11. 5026666 - Method of making integrated circuits having a planarized dielectric (1991-06-25),
12. 4980301 - Method for reducing mobile ion contamination in semiconductor integrated (1990-12-25),
13. 4832789 - Semiconductor devices having multi-level metal interconnects (1989-05-23),

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Title: Unveiling the Innovation Legacy of Graham W Hills from Los Gatos, CA

Introduction:

Graham W Hills, a prolific inventor hailing from Los Gatos, CA, has made significant contributions to the field of semiconductor technology with a remarkable portfolio of 13 patents.

Latest Patents:

1. Mechanism for bow reduction and critical dimension control in etching silicon dioxide using hydrogen-containing additive gases in fluorocarbon gas chemistry.

2. Plasma reactor with enhanced plasma uniformity by gas addition.

Career Highlights:

Graham W Hills has honed his expertise while working at renowned companies such as Applied Materials, Inc. and AT&T Bell Laboratories. These experiences have undoubtedly played a pivotal role in shaping his inventive mindset and refining his technical skills.

Collaborations:

Throughout his journey, Graham has collaborated closely with esteemed peers in the industry, including Yuh-Jia (Jim) Su and Yoshiaki Tanase. These collaborations have not only enriched his professional network but also fostered a culture of innovation through shared knowledge and expertise.

Conclusion:

In conclusion, Graham W Hills stands as a testament to the power of innovation and dedication in advancing technology. His patents reflect a deep understanding of semiconductor processes and a relentless pursuit of excellence in engineering solutions. Los Gatos, CA, can proudly claim him as one of its own, a visionary inventor leaving a lasting impact on the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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