Eindhoven, Netherlands

Gerardus Adrianus Antonius Maria Kusters



Average Co-Inventor Count = 7.6

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2013-2022

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Gerardus Adrianus Antonius Maria Kusters: Pioneering Inventor from Eindhoven

Introduction:

Gerardus Adrianus Antonius Maria Kusters, a prolific inventor based in Eindhoven, NL, has made significant contributions to the field of lithographic apparatus and device manufacturing. With a total of 12 patents to his name, Kusters stands out as a visionary in the world of technology and innovation.

Latest Patents:

Kusters' latest patents showcase his expertise in immersion lithographic apparatus and device manufacturing methods. One of his notable inventions includes an immersion lithographic apparatus featuring a substrate table with a specialized drain to handle immersion fluid leakage. Additionally, he developed a thermal conditioning system to optimize the performance of the apparatus. Another groundbreaking patent involves a temperature sensing probe with high thermal conductivity, revolutionizing temperature measurement in lithographic processes.

Career Highlights:

Gerardus Adrianus Antonius Maria Kusters is associated with the renowned company ASML Netherlands B.V. (ASML), a leading manufacturer of photolithography machines used in the semiconductor industry. Through his innovative work at ASML, Kusters has played a pivotal role in advancing semiconductor manufacturing technology and enhancing lithographic processes.

Collaborations:

In his collaborative endeavors, Kusters has worked closely with esteemed colleagues such as Thibault Simon Mathieu Laurent and Johan Gertrudis Cornelis Kunnen. Together, they have pushed the boundaries of technological innovation and paved the way for cutting-edge developments in the industry.

Conclusion:

Gerardus Adrianus Antonius Maria Kusters' remarkable journey as an inventor underscores his passion for pioneering technological solutions and driving progress in the field of lithographic apparatus and device manufacturing. His dedication to innovation and commitment to excellence continue to inspire future generations of inventors and innovators worldwide.

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