The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Apr. 03, 2007
Maurice Wijckmans, Eindhoven, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Frits Van Der Meulen, Einhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Frederik Eduard DE Jong, Eindhoven, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Edwin Augustinus Matheus Van Gompel, Veldhoven, NL;
Martin Frans Pierre Smeets, Veldhoven, NL;
Rob Jansen, Veldhoven, NL;
Gerardus Adrianus Antonius Maria Kusters, Eindhoven, NL;
Martijn Van Baren, Joure, NL;
Maurice Wijckmans, Eindhoven, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Frits Van Der Meulen, Einhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Frederik Eduard De Jong, Eindhoven, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Edwin Augustinus Matheus Van Gompel, Veldhoven, NL;
Martin Frans Pierre Smeets, Veldhoven, NL;
Rob Jansen, Veldhoven, NL;
Gerardus Adrianus Antonius Maria Kusters, Eindhoven, NL;
Martijn Van Baren, Joure, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.