The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2015
Filed:
Jun. 22, 2010
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Niek Jacobus Johannes Roset, Eindhoven, NL;
Gerardus Adrianus Antonius Maria Kusters, Eindhoven, NL;
Alexander Nikolov Zdravkov, Eindhoven, NL;
Hrishikesh Patel, Eindhoven, NL;
Sander Van Opstal, Tilburg, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Niek Jacobus Johannes Roset, Eindhoven, NL;
Gerardus Adrianus Antonius Maria Kusters, Eindhoven, NL;
Alexander Nikolov Zdravkov, Eindhoven, NL;
Hrishikesh Patel, Eindhoven, NL;
Sander Van Opstal, Tilburg, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.