The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2022
Filed:
Oct. 17, 2019
Asml Netherlands B.v., Veldhoven, NL;
Hrishikesh Patel, Eindhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Gerardus Adrianus Antonius Maria Kusters, Eindhoven, NL;
Thibault Simon Mathieu Laurent, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Ruud Hendricus Martinus Johannes Bloks, Helmond, NL;
Peng Feng, Veldhoven, NL;
Johan Gertrudis Cornelis Kunnen, Weert, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.