Company Filing History:
Years Active: 1999-2011
Title: Fumiki Aiso: Innovator in Semiconductor Technology
Introduction
Fumiki Aiso is a prominent inventor based in Tokyo, Japan, known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, Aiso has made remarkable advancements in the field, particularly in the design and formation of semiconductor devices.
Latest Patents
Aiso's latest patents include a method of forming a semiconductor device that features a trench gate structure. This innovative method involves processes such as forming grooves in both insulating and semiconductor regions, while also creating burrs at the boundary between these regions. The method further includes the selective formation of protection films on the inside walls of the grooves, excluding the bottom walls, followed by a selective thermal process to remove the burrs. Another notable patent is for a semiconductor device that incorporates an elevated source/drain structure of varying cross-section. This device is designed to ensure that the orthographic projection image of the upper end portion of the elevated source/drain structure aligns with a predetermined shape defined by the oxide film and gate wiring on the semiconductor silicon substrate.
Career Highlights
Throughout his career, Aiso has worked with notable companies such as Elpida Memory, Inc. and NEC Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.
Collaborations
Aiso has collaborated with several talented individuals in the field, including Toshiyuki Hirota and Hirohito Watanabe. These collaborations have fostered an environment of innovation and creativity, leading to the development of advanced semiconductor solutions.
Conclusion
Fumiki Aiso's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices, showcasing the importance of innovation in technology.