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For the Inventor, By the Inventor

Fujisawa, Japan

Fumikazu Itoh

This inventor holds 20 USPTO granted patents, primarily in Focused Ion Beam Technology. Top assignee: Hitachi, Ltd.. Active years: 1980-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumikazu Itoh. Retrieved from https://idiyas.com/inventor/fumikazu-itoh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20

% Patents Active = 100.0

Average Co-Inventor Count = 6.3

ph-index = 15

Forward Citations = 693(Granted Patents)


Company Filing History:

goldMedal20 out of 42,752 
 
Hitachi, Ltd.
 patents

Years Active: 1980-2004

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Areas of Expertise:
Focused Ion Beam
Semiconductor Processing
Optical Mask
Phase Shift Mask
Charged Beam
Reactive Gases
Micro Etching
Superlattice Structure
Winding Machine
Device Manufacturing
20 patents (USPTO):Explore Patents
1. 6753253 - Method of making wiring and logic corrections on a semiconductor device by use of focused ion beams (2004-06-22),
2. 5825035 - Processing method and apparatus using focused ion beam generating means (1998-10-20),
3. 5683547 - Processing method and apparatus using focused energy beam (1997-11-04),
4. 5656811 - Method for making specimen and apparatus thereof (1997-08-12),
5. 5583344 - Process method and apparatus using focused ion beam generating means (1996-12-10),
6. 5504340 - Process method and apparatus using focused ion beam generating means (1996-04-02),
7. 5447614 - Method of processing a sample using a charged beam and reactive gases (1995-09-05),
8. 5439763 - Optical mask and method of correcting the same (1995-08-08),
9. 5358806 - Phase shift mask, method of correcting the same and apparatus for (1994-10-25),
10. 5342448 - Apparatus for processing a sample using a charged beam and reactive gases (1994-08-30),
11. 5229607 - Combination apparatus having a scanning electron microscope therein (1993-07-20),
12. 5223109 - Ion beam processing method and apparatus (1993-06-29),
13. 5113072 - Device having superlattice structure, and method of and apparatus for (1992-05-12),
14. 5086015 - Method of etching a semiconductor device by an ion beam (1992-02-04),
15. 5055696 - Multilayered device micro etching method and system (1991-10-08),

Title: The Innovative Journey of Fumikazu Itoh

Introduction: Fumikazu Itoh, a visionary inventor hailing from Fujisawa, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Fumikazu Itoh holds several patents in the field of robotics and artificial intelligence, with his most recent inventions focusing on advanced human-machine interfaces and autonomous systems.

Career Highlights: With a career spanning over two decades, Fumikazu Itoh has worked with leading tech companies in Japan, spearheading research and development projects that have pushed the boundaries of technological advancement.

Collaborations: Throughout his career, Fumikazu Itoh has collaborated with top researchers, engineers, and scientists from around the globe, fostering a culture of innovation and creativity in the projects he undertakes.

Conclusion: Fumikazu Itoh's relentless pursuit of innovation and his passion for creating cutting-edge technologies continue to inspire the next generation of inventors and shape the future of the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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