The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1992
Filed:
Oct. 10, 1990
Hiroshi Yamaguchi, Fujisawa, JP;
Keiya Saito, Yokohama, JP;
Fumikazu Itoh, Fujisawa, JP;
Koji Ishida, Musashino, JP;
Shinji Sakano, Hachiouji, JP;
Masao Tamura, Tokorozawa, JP;
Shoji Shukuri, Koganei, JP;
Tohru Ishitani, Sayama, JP;
Tsuneo Ichiguchi, Hachiouji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Disclosed is an apparatus for forming a device having a fine structure, the apparatus including a high intensity ion source. The apparatus can be used to form fine grooves and/or a fine film, by supplying a reactive gas to the surface to be etched or coated while irradiating a focused ion beam on the surface. A laser or electron beam can be irradiated on substantially the same axis as that of the focused ion beam, whereby defects arising due to ion beam processing can be repaired. The apparatus can further include ion beam current detection and measurement structure to determine when a predetermined thickness of coating or depth of etching is achieved. The apparatus can include multiple chambers sequentially holding the surface treated, and can include a scanning electron microscope for scanning the surface being coated or etched.