The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1994
Filed:
Mar. 31, 1993
Yuuichi Hamamura, Yokohama, JP;
Satoshi Haraichi, Tsukuba, JP;
Akira Shimase, Yokohama, JP;
Junzou Azuma, Yokohama, JP;
Fumikazu Itoh, Fujisawa, JP;
Toshio Yamada, Hamura, JP;
Yasuhiro Koizumi, Sayama, JP;
Michinobu Mizumura, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of processing a sample using a charged beam and reactive gases and a system employing the same, the method and system being able to perform the reactive etching and the beam assisted deposition using a charged particle detector free from the degradation of the performance due to the reactive gas. The system is designed in such a way that a shutter mechanism is provided in the form of the charged particle detector, and a chamber for accommodating the charged particle detector can be evacuated. In the observation of the sample, the charged particle detector is turned on to open the shutter mechanism, and in the processing of the sample, the charged particle detector is turned off or left as it is to shut the shutter mechanism to evacuate the inside of the charged particle detector.