Company Filing History:

11 out of 42,485

Hitachi, Ltd.

patents

1 out of 1

Veb Carl Zeiss Jena. Ddr.

patent

1 out of 51

Shinmaywa Industries, Ltd.

patents

4. 1 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1986-2005

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 6863018 - Ion plating device and ion plating method (2005-03-08),

2. 6831413 - Plasma display panel (2004-12-14),

3. 6816134 - Plasma display panel (2004-11-09),

4. 6579428 - Arc evaporator, method for driving arc evaporator, and ion plating apparatus (2003-06-17),

5. 6476387 - Method and apparatus for observing or processing and analyzing using a charged beam (2002-11-05),

6. 6303932 - Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beam (2001-10-16),

7. 5786112 - Photomask manufacturing process and semiconductor integrated circuit (1998-07-28),

8. 5447614 - Method of processing a sample using a charged beam and reactive gases (1995-09-05),

9. 5439763 - Optical mask and method of correcting the same (1995-08-08),

10. 5358806 - Phase shift mask, method of correcting the same and apparatus for (1994-10-25),

11. 5342448 - Apparatus for processing a sample using a charged beam and reactive gases (1994-08-30),

12. 4704348 - Exposure of uniform fine pattern on photoresist (1987-11-03),

13. 4609566 - Method and apparatus for repairing defects on a photo-mask pattern (1986-09-02),

Title: Yasuhiro Koizumi: Innovator in Ion Plating and Plasma Display Technology

Introduction

Yasuhiro Koizumi is a prominent inventor based in Nishinomiya, Japan. He holds a total of 13 patents that showcase his contributions to the fields of ion plating and plasma display technology. His innovative work has significantly impacted various industries, particularly in the development of advanced materials and display systems.

Latest Patents

Among his latest patents, Koizumi has developed an ion plating device and an ion plating method. This method involves holding a substrate on a substrate holder within an evacuated vacuum chamber, where plasma is generated to form a film. A unique bias voltage, composed of a negative bias component and a pulse bias component, is supplied to the vacuum chamber through the substrate holder. This innovative approach allows for precise control over the ion plating process.

Another notable patent is for a plasma display panel (PDP). This panel consists of a front panel equipped with display electrodes and a rear panel with address electrodes. The PDP displays images by causing discharge in a small discharge space formed between the two panels. Koizumi's design includes two layers of protective films made of metallic oxide, enhancing the discharge characteristics and water-adsorption properties of the panel.

Career Highlights

Throughout his career, Yasuhiro Koizumi has worked with several esteemed companies, including Hitachi, Ltd. and VEB Carl Zeiss Jena. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in his field.

Collaborations

Koizumi has collaborated with notable coworkers such as Akira Shimase and Junzou Azuma. Their combined expertise has fostered innovation and advancement in the technologies they have developed together.

Conclusion

Yasuhiro Koizumi's contributions to ion plating and plasma display technology have established him as a significant figure in the field of innovation. His patents reflect a commitment to advancing technology and improving the functionality of modern devices.

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