The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Mar. 20, 2001
Applicants:
Yasuhiro Koizumi, Hyogo, JP;
Kouichi Nose, Hyogo, JP;
Isao Tokomoto, Hyogo, JP;
Inventors:
Assignee:
Shinmaywa Industries, Ltd., Hyogo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C016/00 ; H05H001/00 ; H01G037/317 ;
U.S. Cl.
CPC ...
Abstract
In ion plating in which a substrate is held on a substrate holder placed in an evacuated vacuum chamber and plasma is generated in the vacuum chamber to be formed into a film, a bias voltage composed of a negative bias component having a predetermined negative voltage value for a predetermined output time and a pulse bias component corresponding to a pulse output having a constant positive value for a predetermined time and output with a cycle set in the rage of 1 kHz-1 GHz is supplied to the inside of the vacuum chamber through the substrate holder by a power supply unit.