Osaka, Japan

Kouichi Nose


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 41(Granted Patents)


Location History:

  • Nishinomiya, JP (2003)
  • Osaka, JP (2004)
  • Hyogo, JP (2005)

Company Filing History:


Years Active: 2003-2005

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4 patents (USPTO):

Title: Kouichi Nose: Innovator in Ion Plating and Plasma Display Technology

Introduction

Kouichi Nose is a prominent inventor based in Osaka, Japan. He has made significant contributions to the fields of ion plating and plasma display technology. With a total of 4 patents to his name, his work has had a lasting impact on these industries.

Latest Patents

One of Kouichi Nose's latest patents is an ion plating device and method. This innovation involves a substrate held on a substrate holder within an evacuated vacuum chamber. Plasma is generated in this chamber to form a film. A bias voltage, composed of a negative bias component with a predetermined negative voltage value and a pulse bias component, is supplied through the substrate holder. This process operates with a cycle set in the range of 1 kHz to 1 GHz.

Another notable patent is for a plasma display panel (PDP). This panel consists of a front panel equipped with display electrodes and a rear panel with address electrodes. It displays images by causing discharge in a small discharge space formed between the two panels. The design includes two layers of protective films made of metallic oxide, which cover the dielectric layer on the front panel. The outer layer exhibits a high discharge characteristic, while the inner layer has a low water-adsorption characteristic.

Career Highlights

Kouichi Nose has worked with several notable companies throughout his career. He has been associated with Hitachi, Ltd. and Shinmaywa Industries, Ltd. His experience in these organizations has contributed to his expertise in the field of technology and innovation.

Collaborations

Kouichi has collaborated with several talented individuals, including Yasuhiro Koizumi and Isao Tokomoto. These collaborations have further enriched his work and contributed to the advancements in his areas of expertise.

Conclusion

Kouichi Nose is a distinguished inventor whose work in ion plating and plasma display technology has made a significant impact. His innovative patents and collaborations highlight his contributions to the field. His legacy continues to influence future advancements in technology.

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