Hitachi, Ltd.

Other

Shinmaywa Industries, Ltd.

Kouichi Nose

Yasuhiro Koizumi

Isao Tokomoto

Kenichi Onisawa

Tetsuro Minemura

Yasushi Ihara

Akira Katou

Kazuo Uetani

Shiro Takigawa

Yukio Miya

Shirou Takigawa

Takanobu Hori

In ion plating in which a substrate is held on a substrate holder placed in an evacuated vacuum chamber and plasma is generated in the vacuum chamber to be formed into a film, a bias voltage composed of a negative bias component having a predetermined negative voltage value for a predetermined output time and a pulse bias component corresponding to a pulse output having a constant positive value for a predetermined time and output with a cycle set in the rage of 1 kHz-1 GHz is supplied to the inside of the vacuum chamber through the substrate holder by a power supply unit.

Ion plating device and ion plating method

A plasma display panel (PDP), consisting of a front panel ( ) equipped with display electrodes ( ) and a rear panel ( ) equipped with address electrodes ( ), that displays an image by causing discharge in a small discharge space formed between the two panels; wherein there are provided two layers of protective films ( ), made of metallic oxide, covering the dielectric layer ( ) installed on the front panel ( ); the outer, upper layer ( ) being formed into a layer of material with a specific surface area of 20 m /g or more and a film thickness of 1 &mgr;m or less, exhibiting a high discharge characteristic; and the inner, lower layer ( ) being formed into a layer of material with a specific surface area of 10 m /g or less and a film thickness of 1 &mgr;m or more, exhibiting a low water-adsorption characteristic.

Plasma display panel

There is provided a plasma display panel (PDP), consisting of a front panel ( ) equipped with display electrodes ( ) and a rear panel ( ) equipped with address electrodes ( ), that displays an image by causing discharge in a small discharge space formed between the two panels; wherein there are provided two layers of protective films ( ), made of metallic oxide, covering the dielectric layer ( ) installed on the front panel ( ); the outer, upper layer ( ) being formed into a layer of material with a specific surface area of 20 m /g or more and a film thickness of 1 &mgr;m or less, exhibiting a high discharge characteristic; and the inner, lower layer ( ) being formed into a layer of material with a specific surface area of 10 m /g or less and a film thickness of 1 &mgr;m or more, exhibiting a low water-adsorption characteristic.

An arc evaporator comprises: an anode; an evaporation source electrode as a cathode; and a current control unit for supplying an AC square wave arcing current across the anode and the evaporation source electrode.

Arc evaporator, method for driving arc evaporator, and ion plating apparatus

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Osaka, Japan

Kouichi Nose