Company Filing History:
Years Active: 1994-1998
Title: Yuuichi Hamamura: Innovator in Focused Ion Beam Technology
Introduction
Yuuichi Hamamura is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of focused ion beam technology, holding a total of 5 patents. His work has advanced the capabilities of ion beam processing, which is crucial in various applications, including semiconductor manufacturing.
Latest Patents
Hamamura's latest patents include a processing method and apparatus using focused ion beam generating means. This innovative method utilizes a plasma ion source to generate a focused ion beam. It is characterized by the use of an insulator to cover the inner wall of a plasma holding vessel, excluding the reference electrode and ion extraction electrode. The method allows for continuous control of the absolute value of the ion beam current, stabilizing the ion beam and preventing dimming even when the current value changes. Another patent details a processing apparatus that includes a plasma or liquid metal ion source, an ion beam generator, and a focusing device, enabling precise machining and analysis of samples such as silicon wafers.
Career Highlights
Yuuichi Hamamura is currently employed at Hitachi, Ltd., where he continues to innovate in the field of ion beam technology. His work has been instrumental in enhancing the performance and reliability of focused ion beam systems.
Collaborations
Some of his notable coworkers include Michinobu Mizumura and Junzou Azuma, who have collaborated with him on various projects related to ion beam technology.
Conclusion
Yuuichi Hamamura's contributions to focused ion beam technology have established him as a key figure in the field. His innovative patents and ongoing work at Hitachi, Ltd. continue to influence advancements in semiconductor processing and related technologies.