The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 1993
Filed:
Jun. 12, 1991
Hironobu Matsui, An Yang, JP;
Mikio Ichihashi, Kodaira, JP;
Sumio Hosaka, Hinode, JP;
Yoshinori Nakayama, Sayama, JP;
Satoshi Haraichi, Yokohama, JP;
Fumikazu Itoh, Fujisawa, JP;
Akira Shimase, Yokohama, JP;
Yoshimasa Kondo, Koganei, JP;
Shigeyuki Hosoki, Hachioji, JP;
Masakazu Ichikawa, Tokyo, JP;
Yukio Honda, Fuchu, JP;
Tsuyoshi Hasegawa, Tokyo, JP;
Shiji Okazaki, Urawa, JP;
Shunji Maeda, Yokohama, JP;
Hitoshi Kubota, Fujisawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A combination apparatus having a scanning electron microscope includes equipment for performing any of observing, measuring and processing operations on a sample placed in a sample chamber. The sample chamber contains a focused electron beam irradiating unit apart from the components for performing the observing, measuring and processing operations. The focused electron beam irradiating unit irradiates a finely focused electron beam onto the surface of the sample for electron microscopic observation in scanning fashion. This setup allows the observing, measuring or processing equipment to combine with the scanning electron microscope without appreciably enlarging the construction of the combination apparatus.