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For the Inventor, By the Inventor

Dresden, Germany

Frank Seliger

USPTO Granted Patents = 13

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 31(Granted Patents)


Location History:

  • Zeitz, DE (2008)
  • Dresden, DE (2011 - 2015)

Company Filing History:

goldMedal10 out of 5,671 
 
Globalfoundries Inc.
 patents
silverMedal3 out of 12,867 
 
Advanced Micro Devices Corporation
 patents

Years Active: 2008-2015

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13 patents (USPTO):
1. 8987103 - Multi-step deposition of a spacer material for reducing void formation in a dielectric material of a contact level of a semiconductor device (2015-03-24),
2. 8932930 - Enhancing integrity of a high-K gate stack by protecting a liner at the gate bottom during gate head exposure (2015-01-13),
3. 8765559 - Sophisticated gate electrode structures formed by cap layer removal with reduced loss of embedded strain-inducing semiconductor material (2014-07-01),
4. 8765542 - Methods of forming a semiconductor device while preventing or reducing loss of active area and/or isolation regions (2014-07-01),
5. 8561446 - Method and device for fabricating bonding wires on the basis of microelectronic manufacturing techniques (2013-10-22),
6. 8338306 - Forming semiconductor resistors in a semiconductor device comprising metal gates by increasing etch resistivity of the resistors (2012-12-25),
7. 8338284 - Stress engineering in a contact level of semiconductor devices by stressed conductive layers and an isolation spacer (2012-12-25),
8. 8329549 - Enhancing integrity of a high-k gate stack by protecting a liner at the gate bottom during gate head exposure (2012-12-11),
9. 8329526 - Cap removal in a high-k metal gate electrode structure by using a sacrificial fill material (2012-12-11),
10. 8258062 - Cap layer removal in a high-K metal gate stack by using an etch process (2012-09-04),
11. 7981740 - Enhanced cap layer integrity in a high-K metal gate stack by using a hard mask for offset spacer patterning (2011-07-19),
12. 7951677 - Corner rounding in a replacement gate approach based on a sacrificial fill material applied prior to work function metal deposition (2011-05-31),
13. 7375032 - Semiconductor substrate thinning method for manufacturing thinned die (2008-05-20),

Title: The Innovative Contributions of Frank Seliger

Introduction

Frank Seliger is a prominent inventor based in Dresden, Germany, known for his significant contributions to the field of semiconductor technology. With a total of 13 patents to his name, Seliger has made remarkable advancements that enhance the performance and reliability of semiconductor devices.

Latest Patents

One of Seliger's latest patents focuses on the multi-step deposition of a spacer material aimed at reducing void formation in the dielectric material of a contact level in semiconductor devices. This innovative approach utilizes a multi-station deposition technique, allowing for variability in the thickness of sub-layers of spacer materials. This variability enhances etch conditions during the anisotropic etch process, resulting in improved shapes of spacer elements and superior deposition conditions. This advancement is particularly beneficial in minimizing yield losses due to contact failures in densely packed device areas, such as static RAM areas.

Another notable patent by Seliger involves enhancing the integrity of a high-K gate stack by protecting a liner at the gate bottom during gate head exposure. This sophisticated method employs a protection liner, such as a silicon nitride liner, which is maintained throughout the entire manufacturing sequence. By applying a mask material before removing cap materials and spacer layers, Seliger's technique ensures enhanced integrity while avoiding multiple lithography processes.

Career Highlights

Throughout his career, Frank Seliger has worked with leading companies in the semiconductor industry, including GlobalFoundries Inc. and Advanced Micro Devices Corporation. His expertise and innovative mindset have allowed him to contribute significantly to the development of advanced semiconductor technologies.

Collaborations

Seliger has collaborated with notable professionals in the field, including Markus Lenski and Ralf Richter. These collaborations have further enriched his work and contributed to the advancement of semiconductor technology.

Conclusion

Frank Seliger's innovative patents and contributions to the semiconductor industry highlight his role as a leading inventor. His work continues to influence the development of advanced technologies that enhance the performance and reliability of semiconductor devices.

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