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Feng Li

USPTO Granted Patents = 15 (Patent Applications = 5)

Average Co-Inventor Count = 5.1

ph-index = 4

Forward Citations = 232(Granted Patents)

Company Filing History:

L'air Liquide, Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude

patents

2 out of 4

Photonify Technologies, Inc.

American Air Liquide, Inc.

patents

where one patent can have more than one assignee

Years Active: 2003-2023

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11821080 - Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes (2023-11-21),

2. 11577967 - Tungsten pentachloride conditioning and crystalline phase manipulation (2023-02-14),

3. 11066310 - Tungsten pentachloride conditioning and crystalline phase manipulation (2021-07-20),

4. 10899630 - Tungsten pentachloride conditioning and crystalline phase manipulation (2021-01-26),

5. 10710896 - Tungsten pentachloride conditioning and crystalline phase manipulation (2020-07-14),

6. 10669160 - Heterogeneous wet synthesis process for preparation of high purity tungsten pentahalide (2020-06-02),

7. 9006795 - Resistance-switching memory cells adapted for use at low voltage (2015-04-14),

8. 8686476 - Resistance-switching memory cells adapted for use at low voltage (2014-04-01),

9. 8350299 - Memory with high dielectric constant antifuses adapted for use at low voltage (2013-01-08),

10. 8314023 - Methods involving memory with high dielectric constant antifuses adapted for use at low voltage (2012-11-20),

11. 7781805 - Memory with high dielectric constant antifuses adapted for use at low voltage (2010-08-24),

12. 7451412 - Speeding up timing analysis by reusing delays computed for isomorphic subcircuits (2008-11-11),

13. 7212454 - Method and apparatus for programming a memory array (2007-05-01),

14. 6735458 - Self-calibrating optical imaging system (2004-05-11),

15. 6516209 - Self-calibrating optical imaging system (2003-02-04),

Title: The Innovative Contributions of Feng Li

Introduction

Feng Li is a prominent inventor based in San Jose, California, known for his significant contributions to the field of thin film deposition processes. With a remarkable portfolio of 15 patents, he has made strides in advancing technologies that are crucial for various applications in materials science.

Latest Patents

Feng Li's latest patents include innovative processes that enhance the efficiency of thin film deposition. One notable patent involves reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes. This process entails reacting a metal-oxo or metal oxyhalide precursor with an oxophilic reagent in a reactor containing the substrate to deoxygenate the precursor. The result is the formation of a metal or metal nitride film on the substrate through a vapor deposition process. The substrate is exposed to both the metal oxyhalide precursor and the oxophilic reagent either simultaneously or sequentially, followed by exposure to a reducing agent after deoxygenation.

Another significant patent focuses on tungsten pentachloride conditioning and crystalline phase manipulation. This process details how to condition tungsten pentachloride to form specific crystalline phases, which allow for stable vapor pressures over extended periods during vapor deposition and etching processes.

Career Highlights

Feng Li has worked with notable companies such as SanDisk 3D LLC and L'Air Liquide Société Anonyme Pour L'Étude et L'Exploitation des Procédés Georges Claude. His experience in these organizations has contributed to his expertise in the field and has enabled him to develop groundbreaking technologies.

Collaborations

Feng Li has collaborated with esteemed colleagues, including Xiaoyu Yang and Jean-Marc Girard, to further enhance his research and development efforts. Their combined expertise has led to innovative solutions in the realm of thin film deposition.

Conclusion

Feng Li's contributions to the field of thin film deposition are noteworthy, with a strong portfolio of patents that reflect his innovative spirit. His work continues to influence advancements in materials science and technology.

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