The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2020

Filed:

Apr. 30, 2018
Applicants:

L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;

American Air Liquide, Inc., Fremont, CA (US);

Inventors:

Yumin Liu, San Jose, CA (US);

Feng Li, San Jose, CA (US);

Zhiwen Wan, Plano, TX (US);

Claudia Fafard, Newark, DE (US);

Stefan Wiese, San Jose, CA (US);

Guillaume Husson, Newark, DE (US);

Grigory Nikiforov, Bridgewater, NJ (US);

Bin Sui, Houston, TX (US);

Jean-Marc Girard, Versailles, FR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C01G 41/04 (2006.01);
U.S. Cl.
CPC ...
C01G 41/04 (2013.01);
Abstract

Synthesis of tungsten pentahalide compositions having low impurity profiles are disclosed. The specific impurity profile permits deposition of high purity tungsten-containing films using vapor deposition processes or other semiconductor manufacturing processes without introduction of performance-impacting contaminants.


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