Feng-Inn Wu

Title: Innovations of Feng-Inn Wu in Semiconductor Manufacturing

Introduction

Feng-Inn Wu is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 14 patents. His work has been instrumental in advancing technologies that are crucial for modern electronics.

Latest Patents

Wu's latest patents include a method of manufacturing a semiconductor device and a semiconductor device itself. In this innovative method, a sacrificial gate structure is formed over a substrate, which includes a sacrificial gate electrode. A first dielectric layer is created over this structure, followed by a second dielectric layer. These layers are then planarized and recessed, exposing the upper portion of the sacrificial gate structure while embedding the lower portion in the first dielectric layer. A third dielectric layer is formed over the exposed sacrificial gate structure, and a fourth dielectric layer is added on top. The process involves careful planarization to ensure the sacrificial gate electrode is exposed while maintaining part of the third dielectric layer on the recessed first dielectric layer. The sacrificial gate electrode is ultimately removed, showcasing Wu's innovative approach to semiconductor device manufacturing.

Another notable patent involves the creation of a CMP safe alignment mark. This technique describes the process of etching a recess in a first surface region of a wafer, while a device structure is formed in a second surface region. A dielectric layer is deposited to fill the recess, followed by a series of planarization procedures to ensure the device structures are accurately aligned.

Career Highlights

Feng-Inn Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative spirit have contributed to the company's reputation for excellence in semiconductor manufacturing.

Collaborations

Wu has collaborated with notable colleagues, including Sheng-Chen Wang and Shu-Bin Hsu, who have also made significant contributions to the field. Their teamwork has fostered an environment of innovation and creativity within the company.

Conclusion

Feng-Inn Wu's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced technologies that shape the future of electronics.