The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Dec. 01, 2011
Sheng-chen Wang, Taichung, TW;
Feng-inn Wu, Hsinchu, TW;
Chih-hung Tsai, Taichung, TW;
Huang-jen Hsu, Hsinchu, TW;
Te-chia Hsu, Zhubei, TW;
Sheng-Chen Wang, Taichung, TW;
Feng-Inn Wu, Hsinchu, TW;
Chih-Hung Tsai, Taichung, TW;
Huang-Jen Hsu, Hsinchu, TW;
Te-Chia Hsu, Zhubei, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
The present disclosure relates to a slurry distribution system having a distribution tube connected between a mixing tank and a CMP tool. The mixing tank is configured to generate a polishing mixture comprising a diluted slurry having abrasive particles that enable mechanical polishing of a workpiece. The polishing mixture is transported between the mixing tank and a CMP tool by way of a transport piping. An energy source, in communication with the transport piping, transfers energy to the abrasive particles within the polishing mixture, thereby preventing accumulation of the abrasive particles within the transport piping.