Company Filing History:

13 out of 164,108

International Business Machines Corporation

patents

1 out of 30,028

Siemens Aktiengesellschaft

patents

1 out of 13,684

Applied Materials, Inc.

patents

4. 3 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 2000-2007

where 'Filed Patents' based on already Granted Patents

16 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 7214623 - Planarization system and method using a carbonate containing fluid (2007-05-08),

2. 7064064 - Copper recess process with application to selective capping and electroless plating (2006-06-20),

3. 7041600 - Methods of planarization (2006-05-09),

4. 7040966 - Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers (2006-05-09),

5. 6975032 - Copper recess process with application to selective capping and electroless plating (2005-12-13),

6. 6780695 - BiCMOS integration scheme with raised extrinsic base (2004-08-24),

7. 6764922 - Method of formation of an oxynitride shallow trench isolation (2004-07-20),

8. 6709951 - Oxynitride shallow trench isolation and method of formation (2004-03-23),

9. 6498383 - Oxynitride shallow trench isolation and method of formation (2002-12-24),

10. 6368969 - Chemical-mechanical polishing methods (2002-04-09),

11. 6365328 - Semiconductor structure and manufacturing method (2002-04-02),

12. 6344414 - Chemical-mechanical polishing system having a bi-material wafer backing film assembly (2002-02-05),

13. 6264789 - System for dispensing polishing liquid during chemical mechanical polishing of a semiconductor wafer (2001-07-24),

14. 6225224 - System for dispensing polishing liquid during chemical mechanical polishing of a semiconductor wafer (2001-05-01),

15. 6171513 - Chemical-mechanical polishing system having a bi-material wafer backing film and two-piece wafer carrier (2001-01-09),

Title: The Innovative Journey of Fen Fen Jamin

Introduction

Fen Fen Jamin is a prominent inventor based in Wappingers Falls, NY (US). She has made significant contributions to the field of technology, holding a total of 16 patents. Her work primarily focuses on advancements in polishing systems and integrated circuit structures.

Latest Patents

Among her latest patents is a "Planarization system and method using a carbonate containing fluid." This invention discloses a system and method for polishing a layer of a substrate. The method includes providing a polishing apparatus that imparts relative movement between a polishing pad and a substrate. It also involves using a liquid medium with a pH between 4 and 11, which includes a pH controlling substance, a carbonate, and a stabilizer additive. Another notable patent is the "Copper recess process with application to selective capping and electroless plating." This patent describes an integrated circuit structure that features a layer of logical and functional devices along with an interconnection layer above it.

Career Highlights

Fen Fen Jamin has worked with several esteemed organizations, including the International Business Machines Corporation (IBM). Her experience in these companies has allowed her to develop and refine her innovative ideas, contributing to her impressive portfolio of patents.

Collaborations

Throughout her career, Fen Fen has collaborated with notable professionals, including Kenneth M Davis and Michael F Lofaro. These collaborations have further enriched her work and expanded her impact in the field of technology.

Conclusion

Fen Fen Jamin's contributions to innovation and technology are commendable. Her patents reflect her dedication to advancing the industry and her ability to solve complex problems. She continues to inspire future generations of inventors and innovators.

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