The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2007
Filed:
Oct. 13, 2003
Donald J. Delehanty, Wappingers Falls, NY (US);
James W. Hannah, Ossining, NY (US);
Daniel M. Heenan, Lagrangeville, NY (US);
Fen F. Jamin, Wappingers Falls, NY (US);
Laertis Economikos, Wappingers Falls, NY (US);
Donald J. Delehanty, Wappingers Falls, NY (US);
James W. Hannah, Ossining, NY (US);
Daniel M. Heenan, Lagrangeville, NY (US);
Fen F. Jamin, Wappingers Falls, NY (US);
Laertis Economikos, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed herein are a system and method of polishing a layer of a substrate. The disclosed method includes providing a polishing apparatus adapted to impart relative movement between a polishing pad and a substrate having a first layer to be polished; providing a liquid medium having a pH between 4 and 11 to an interface between the substrate and the polishing pad, the liquid medium including a pH controlling substance including at least one of an acid and a base, a carbonate and a stabilizer additive comprising at least one selected from the group consisting of amino acids and polyacrylic acid; and moving at least one of the substrate and the polishing pad relative to the other to polish the layer of the substrate.