Location History:
- North East, MD (US) (2006)
- Lagrangeville, NY (US) (2007)
Company Filing History:
2 out of 164,197 
1 out of 13,713 
Years Active: 2006-2007
Title: The Innovations of Daniel M Heenan
Introduction
Daniel M Heenan is an accomplished inventor based in Lagrangeville, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in polishing systems and methods. With a total of 2 patents to his name, Heenan's work has had a notable impact on the industry.
Latest Patents
Heenan's latest patents include a "Planarization system and method using a carbonate containing fluid." This patent discloses a system and method for polishing a layer of a substrate. The method involves providing a polishing apparatus that allows relative movement between a polishing pad and a substrate. It also includes a liquid medium with a pH between 4 and 11, which contains a pH controlling substance, a carbonate, and a stabilizer additive. The process aims to effectively polish the layer of the substrate.
Another significant patent is "Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers." This method and polishing system focus on planarizing a substrate with various materials. It includes positioning the substrate near a polishing pad and dispensing a polishing fluid that has been carbonated before application. This innovative approach enhances the polishing process for semiconductor wafers.
Career Highlights
Throughout his career, Daniel M Heenan has worked with prominent companies such as IBM and Applied Materials, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Heenan has collaborated with notable coworkers, including Laertis Economikos and Fen Fen Jamin. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Daniel M Heenan's contributions to the field of semiconductor technology through his patents and collaborations highlight his innovative spirit and dedication to advancing industry standards. His work continues to influence the development of effective polishing systems and methods.