Donald J Delehanty

Title: The Innovations of Donald J Delehanty

Introduction

Donald J Delehanty is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work primarily focuses on polishing systems and methods that enhance the performance of semiconductor wafers.

Latest Patents

One of his latest patents is titled "Planarization system and method using a carbonate containing fluid." This patent discloses a system and method for polishing a layer of a substrate. The method involves providing a polishing apparatus that allows relative movement between a polishing pad and a substrate. It also includes a liquid medium with a pH between 4 and 11, which contains a pH controlling substance, a carbonate, and a stabilizer additive. Another significant patent is "Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers." This method outlines a polishing system for planarizing a substrate, which includes a polishing fluid that is carbonated before being dispensed to the polishing pad.

Career Highlights

Throughout his career, Donald J Delehanty has worked with prominent companies such as IBM and Applied Materials, Inc. His experience in these organizations has allowed him to develop innovative solutions that address challenges in semiconductor manufacturing.

Collaborations

He has collaborated with notable individuals in the field, including Kenneth John McCullough and Uldis Artis Ziemins. These collaborations have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Donald J Delehanty is a distinguished inventor whose work has significantly impacted semiconductor technology. His innovative patents and collaborations reflect his dedication to advancing the field.