The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 1998

Filed:

Apr. 04, 1997
Applicant:
Inventors:

Donald John Delehanty, Wappingers Falls, NY (US);

Rangarajan Jagannathan, South Burlington, VT (US);

Kenneth John McCullough, Fishkill, NY (US);

Donna Diane Miura, Hopewell Junction, NY (US);

George F Ouimet, Jr, Millbrook, NY (US);

David Lee Rath, Stromville, NY (US);

Bryan Newton Rhoads, Pine Bush, NY (US);

Frank John Schmidt, Jr, Highland Falls, NY (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
438748 ; 438745 ; 438906 ; 216 92 ; 252 792 ;
Abstract

An aqueous etchant composition containing about 0.01 to about 15 percent by weight of sulfuric acid and about 0.01 to about 20 percent by weight of hydrogen peroxide or about 1 to 30 ppm of ozone is effective in removing polymer residue from a substrate, and especially from an integrated circuit chip having aluminum lines thereon.


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