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For the Inventor, By the Inventor

Hopewell Junction, NY, United States of America

Rangarajan Jagannathan

USPTO Granted Patents = 26

Average Co-Inventor Count = 4.8

ph-index = 11

Forward Citations = 430(Granted Patents)


Location History:

  • Patterson, NY (US) (1997)
  • South Bulington, VT (US) (1999)
  • South Burlington, VT (US) (1998 - 2001)
  • Essex Junction, VT (US) (2000 - 2002)
  • East Fishkill, NY (US) (2008 - 2009)
  • Hopewell Junction, NY (US) (1989 - 2021)

Company Filing History:

goldMedal25 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal1 out of 832,680 
Other
 patents

Years Active: 1989-2021

where 'Filed Patents' based on already Granted Patents

26 patents (USPTO):
1. 11199769 - Method and apparatus for neutral beam processing based on gas cluster ion beam technology (2021-12-14),
2. 8536630 - Transistor devices and methods of making (2013-09-17),
3. 8084329 - Transistor devices and methods of making (2011-12-27),
4. 7859013 - Metal oxide field effect transistor with a sharp halo (2010-12-28),
5. 7595010 - Method for producing a doped nitride film, doped oxide film and other doped films (2009-09-29),
6. 7435652 - Integration schemes for fabricating polysilicon gate MOSFET and high-K dielectric metal gate MOSFET (2008-10-14),
7. 7384835 - Metal oxide field effect transistor with a sharp halo and a method of forming the transistor (2008-06-10),
8. 7361611 - Doped nitride film, doped oxide film and other doped films (2008-04-22),
9. 6361402 - Method for planarizing photoresist (2002-03-26),
10. 6254796 - Selective etching of silicate (2001-07-03),
11. 6200891 - Removal of dielectric oxides (2001-03-13),
12. 6191085 - Method for cleaning semiconductor devices (2001-02-20),
13. 6150282 - Selective removal of etching residues (2000-11-21),
14. 6117796 - Removal of silicon oxide (2000-09-12),
15. 6114249 - Chemical mechanical polishing of multiple material substrates and slurry (2000-09-05),

Title: Innovations and Contributions of Rangarajan Jagannathan

Introduction

Rangarajan Jagannathan, located in Hopewell Junction, NY, is a distinguished inventor with an impressive portfolio of 26 patents. His work predominantly focuses on advancements in semiconductor processing and related technologies.

Latest Patents

Among his notable patents are the following:

1. **Method and apparatus for neutral beam processing based on gas cluster ion beam technology**: This innovation involves a method of processing features that extend into a substrate, utilizing an accelerated neutral beam derived from an accelerated gas cluster ion beam to effectively work on materials at the base of these features.

2. **Transistor devices and methods of making**: This patent describes a method to fabricate a transistor device that includes several steps such as anisotropically etching, oxidizing, and isotropically etching a semiconductor topography to create recessed regions in the substrate.

Career Highlights

Rangarajan has made significant contributions to the field of semiconductor technologies during his career, notably working with the International Business Machines Corporation (IBM). His innovations have been instrumental in improving processing methods and fabrication techniques in the industry.

Collaborations

Throughout his professional journey, Rangarajan has collaborated with various distinguished colleagues, including David Lee Rath and Harald F Okorn-Schmidt, which has fostered innovation and advanced research efforts within his teams.

Conclusion

Rangarajan Jagannathan's extensive list of patents and collaborations underscores his role as a significant contributor to the world of technology and innovation. His work continues to influence the semiconductor industry and inspires future generations of inventors.

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