The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2001
Filed:
May. 10, 1999
Emanuel I. Cooper, Bronx, NY (US);
Scott A. Estes, Essex Junction, VT (US);
Glenn W. Gale, Essex Junction, VT (US);
Rangarajan Jagannathan, South Burlington, VT (US);
Harald F. Okorn-Schmidt, Putnam Valley, NY (US);
David L. Rath, Stormville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is provided for treating a plurality of semiconductor substrates using the same aqueous SC-1 solution which solution removes and/or inhibits contamination of the semiconductor surfaces by metallic ions present in the solution or on the substrate surface comprising a basic solution containing hydrogen peroxide and an oxidation-resistant chelating additive such as CDTA in an amount effective to provide the desired treatment results. The SC-1 solution may be the conventional 5:1:1 (water:NH,OH:H,O,) solution or a dilute solution such as a 5:x:1 to 200:x:l solution wherein x is 0.025 to 2.