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For the Inventor, By the Inventor

Austin, TX, United States of America

Glenn Walton Gale

USPTO Granted Patents = 13

Average Co-Inventor Count = 4.9

ph-index = 6

Forward Citations = 90(Granted Patents)


Location History:

  • Essex Junction, VT (US) (1999 - 2002)
  • Austin, TX (US) (2000 - 2004)

Company Filing History:

goldMedal13 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 1999-2004

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):
1. 6783599 - Method of cleaning contaminants from the surface of a substrate (2004-08-31),
2. 6565666 - Capillary dry process and apparatus (2003-05-20),
3. 6514355 - Method and apparatus for recovery of semiconductor wafers from a chemical tank (2003-02-04),
4. 6508014 - Method of drying substrates (2003-01-21),
5. 6356653 - Method and apparatus for combined particle location and removal (2002-03-12),
6. 6354309 - Process for treating a semiconductor substrate (2002-03-12),
7. 6276370 - Sonic cleaning with an interference signal (2001-08-21),
8. 6254796 - Selective etching of silicate (2001-07-03),
9. 6191085 - Method for cleaning semiconductor devices (2001-02-20),
10. 6173720 - Process for treating a semiconductor substrate (2001-01-16),
11. 6117796 - Removal of silicon oxide (2000-09-12),
12. 5966631 - Forced plug processing for high aspect ratio structures (1999-10-12),
13. 5962384 - Method for cleaning semiconductor devices (1999-10-05),

Title: The Innovative Contributions of Glenn Walton Gale

Introduction

Glenn Walton Gale is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of technology, holding a total of 13 patents. His work primarily focuses on methods and processes that enhance the efficiency and effectiveness of various applications.

Latest Patents

Among his latest patents is a method of cleaning contaminants from the surface of a substrate. This innovative technique involves applying a fluid to the surface, lowering the temperature of the fluid to form a solid layer that entraps contaminants, and then applying energy to separate the layer from the surface. Another significant patent is the capillary dry process and apparatus, which describes a method for removing liquid from a semiconductor wafer using capillary channels to draw away the liquid effectively.

Career Highlights

Glenn Gale is currently associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop groundbreaking technologies that have practical applications in various industries.

Collaborations

Throughout his career, Glenn has collaborated with esteemed colleagues such as Harald F Okorn-Schmidt and William Alfred Syverson. These collaborations have contributed to the advancement of innovative solutions in their respective fields.

Conclusion

Glenn Walton Gale's contributions to technology through his patents and collaborations highlight his role as a significant inventor. His innovative methods continue to influence the industry and pave the way for future advancements.

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